溅射离子枪主要用逓�

• 溅射清洗/表面科学中样品表面处理， MBE and HV 溅射过程

• 离子辅助沉积

• 离子束溅射镀膛�/span>

• 反应离子刻蚀

  技术指栆�

  离子能量	25eV - 5keV
  总的离子束电�?/span>	1mA (at 5kV with Argon) High Current Version:up to 4mA (at 5kV with Argon)
  电流密度	120��A/cm2 at 100mm working distance
  离子束发散角	Ion energy dependant (typically 15��)
  工作距离	100 mm (typically)
  等离子体�?/span>	Alumina (superior than other dielectric materials due to highest yield of secondary electrons)
  气体进气口径	CF-16 (1.33“OD)
  气体流逞�/span>	1 - 5 sccm (1�? sccm typical� gas dependant)
  工作真空�?/span>	10-6mbar - 10-3mbar (1x10-5mbar typical in chamber with 300l/s pimp). Low 10-6mbar range possible - beam current then 140��A max.
  激发模弎�/span>	微波放电等离子体 (无灯�?
  安装口径	CF-35 (2.75“OD)
  枪直徃�/span>	34mm (真空�?
  泄露阀	需要气体质量流量计