产品图片９�/span>

产品型号９�/span>

CS-200

产品介绍９�/span>

Dense carbon film for high temp.anneal

Max. Substrate φ200㎛�/span>（Transfer tray available（�/span>

产品特点９�/span>

• 
  

• 1. Key point for carbon process
  - Front(Ion Implantation) and Back(Annealing) processesare well known.

• 2. Good process experience for CC deposition
  - AIST and SIC production company uses ULVAC system.

• 3. Optional items
  - High temp stage, RF stage bias, 3MFC line, DRP, etc.