仪器简介：The e-flux Mini E-Beam Evaporator is an UHV evaporator for small and medium quantities of almost any material in the temperature

range of 400K to 3100K. Evaporation is possible either directly from evaporant in rod form (?26mm)

or out of a crucible. An integrated flux monitor allows maximum deposition control.

Highly efficient watercooling ensures negligible outgassing during operation.

The e-flux electron beam evaporator is very compact and mounted on a CF-40 flange (2.75"OD).

很容易安装在已经有的 UHV � MBE系统上�

主要应用是：表面科学，薄膜沉积，薄膜掺杂

主要蒸发材料� Mo� Ta� W� Au� Ag� Pt� Al� Cu� Ni� Ti� C� Si� Cr

技术参数：

真空腔体内长�? 190mm (without options). Special length possible on request.

**真空端直徃� 34mm

安装法兰口径: NW40CF (2.75"OD)

烘烤温度: max. 200��C

rod feed棒材: 25mm� optionally 50mm

坩埚体积: 0�?ccm

坩埚材料: Mo� Ta� W� pyrol. Graphite� BN liner� Al2O3� Quartz

沉积速率: from <0�?1A/s to >2nm/s

束流发散觑� ��15�� (��12�� with flux monitor)

电子束功玆� max. 600W

控制�? 19" rack mount� 3U high＋�/span>

230VAC/50Hz

选项:

挡板 (manual and motorised)

flux monitor/flux controller� Deposition Controller*

热电偵�/span>

离子阰�/span>

各种坩埚 (see above) with end caps for horizontal mount

motorised rod feed

control options (schematic)

主要特点９�/strong>

独有特点:

1，发射电流稳定�?

The emission current stabilizer is a closed loop control to keep the emission

current constant automatically with rod melting down or decrease of crucible content

2，LED提示棒材位置

An LED alerts when the evaporation rod has to be fed. Threshold can be customer set.

3，可输入需要的发射电流

The emission current can now be set directly on a linear scale for easy reproduction.

4，离子阱选项

The ion trap option allows to deflect all charged particles out of the beam.