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产品图片9/span>
产品型号9/span>
NA-8000
产品特点介绍9/span>
1. All in One system
- All units sucha as M/W plasma and power supply, Controll unit,and pumping units are included in system
2. Applicable for 4 6 SiC wafer
- Batch process using 330mm SiC tray
3. Good process optimization for both CC and PR
- M/W with high temperature stage and O2/N2 gas used
4. Possible to use other applications
- Organic film etching, Residue removal, Polyimide etching, etc
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