仪器简介：

采用**制造工艺，可把平面纳米压印拓展到任意曲面。标准模板分为三类：Quartz Molds� Silicon Molds� Polymer Molds of 2"�?"�?"。适用于Obducat，Suss，HP，EVG等多种型号的纳米压印设备、�/p>

技术参数：

Delivery of nanoimprint templates in various materials (Si� SiNx� SiC� quartz，glass).Maximum area of the templates:4 inch with feature size of 100 nm. For smaller area� minimum feature size of 50 nm.

提供各种材料的纳米压印模板（硅，氮化硅，碳化硅，石英玻璃）。模�?*尺寸�?英寸，特征尺寸为100nm。对于更小的尺寸�?小的特征尺寸可以达到50nm�

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Delivery of EBL service for various structures with the feature size down to 30nm.Substrates: any conducting or non-conducting wafers.

提供*�?0nm特征尺寸的各种结构的电子束刻蚀服务。基板：任何导电或者非导电晶片�

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Micro and nanofabrications for all kinds of nanostructures in a Si� III-V� II-VI and polymers.

各种纳米结构（硅，III-V族元素，II-VI族元素以及聚合物）的微纳米加工、�/p>

主要特点９�/strong>

soft mold for thermal nanoimprint 热压印的软模�

quartz mold for UV nanoimprint 紫外压印的石英模�

silicon mold for thermal nanoimprint 热压印的硅模�