透射电镜/扫描电镜（STM/TEM)专用等离子清洗器（机�?参数-价格-中国粉体罐�/title>

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<p><strong><span>GV10x</span></strong><strong><span>电镜</span></strong><strong><span>等离子清洗器</span></strong></p><p><span>GV10x 是由ibss Group和一个拥�?*的等离子源的***共同合作开发并生产的新一代专门清洗腔体的等离子清洗系统。GV10x可以在分子泵工作的真空压力状态下运行，它比以往传统方法更加有效的（10�?0倍）去除碳和碳氢污染。它能够去除扫描电子显微�?SEM)图像中的假象; 使电子显微镜长久的保持高分辨率和束流稳定性。不但能够消除扫描电子显微镜图像中的黑色扫描方框，针对聚焦离子束(FIB)和透射电子显微�?TEM)中的碳污染同样能得到很好的控制效果、�/span></p><p></p><p><span>GV10x (KF40 version) </span><span><span><strong>GV10xS (CF275 version)</strong></span></span></p><p><span><strong><span><strong><span>GV10x</span><span>顺流灰化器是应用于真空腔体中的原位清洗机的一个全新典范。凭借精妙的顺流工艺＋�/span><span>GV10x</span><span>顺流灰化器比**代方法更加有效和均匀</span><span>10</span><span>�?/span><span>20</span><span>倍地去除碳和碳氢污染。分子泵也可以安全地运行，而不需要中�?/span><span>SEM� FIB</span><span>戕�/span><span>TEM</span><span>系统的软件控制、�/span></strong></span></strong></span></p><p><span><strong><span><strong><span></span></strong></span></strong></span></p><p><span><strong><span><strong></strong></span></strong></span></p><p><span><strong><span>通常</span><span>GV10x</span><span>等离子体清洗器使用空气或氧气产生氧的自由基来去除碳氢污染。此外，</span><span>NIST </span><span>（美国国家标准技术研究所）研究表明，�?/span><span>GV10x</span><span>等离子体清洗器中运用氢气去除沉积在多层镜面和其它衬底以及氧化敏感的样品上的碳沉积方面是安全和有效的� </span></strong></span></p><p><span><strong><span>GV10x</span><span>等离子体清洗器可以很容易地在几个不同的实验室仪器中搬迁。每个腔的清洁周期不同。与普通的等离子清洗机不同的是</span><span>: </span><span>等离子体清洗工艺</span><span>(</span><span>经常被称为远程等离子处理</span><span>)</span><span>并不会产生动力冲击、溅射损伤或者对样品加热� </span></strong><strong></strong><strong></strong></span></p><p><span><strong><span>GV10x</span><span>等离子体清洗器能迅速地清洁扫描电子显微镜腔内的样品，允许快速的假象清除，通常仅需几分钟的时间，而不需给电镜腔体放气� </span></strong></span></p><p><span><strong><span>ibss Group</span><span>皃�/span><span>Gentle Asher</span><span>咋�/span><span>GV10x</span><span>及泵的组合拓展了等离子体清洗技术的应用，即将样品和</span><span>TEM</span><span>样品支撑杆在插入到电镜前进行预清洗，从而延长了电镜清洗的周期、�/span></strong></span></p><p><span><strong><span>GV10x</span><span>等离子体清洗�?/span><span>是一个全新的清洁腔体的典型技术。这个工艺具有更大的清洁均匀性，可以更加迅速地清除位于真空腔远角落表面上的碳污染。这些污染能不断的吸附和重新污染腔体其它部分。由于较大的功率和压力选择范围＋�/span><span>GV10x</span><span>等离子体清洗�?/span><span>可以被运用到除了</span><span>SEM</span><span>腔体之外的清洗，比如清洗同步辐射和紫外光学，临界尺寸扫描电镜</span><span> (CDSEMs)</span><span>＋�/span><span>检测性扫描电镜和</span><span>X-</span><span>射线光电子能谱系统，这些系统的大型腔体都需要均匀和快速的清洁、�/span></strong></span></p><p><span><strong></strong></span></p><p><span><strong></strong></span></p><p><span><strong><span>GV10x</span><span>等离子体清洗器参�?/span><span>９�/span></strong><span>:</span></span></p><p><span><strong><span>功率９�/span></strong><span>5 ~99 W </span><span>连续可调等离子功玆�/span></p><p><span><strong><span>压力９�/span></strong><span>- 2 Torr ~ <5 mTorr (measured at the Source)</span></p><p><span> ��压力（大亍�/span><span>50 </span><span>毫托），清洗气体的平均自由程很短，在靠近等离子源的区域去除污染、�/span></p><p><span> ��压力（小亍�/span><span>50 </span><span>毫托），清洗气体的平均自由程比较长，能均匀的碳污染的清除。同时，</span></p><p><span> 清洗</span><span>发生在分子泵能安全运行的压力下、�/span></p><p><span><strong><span>柔和９�/span></strong><span>使用中性氧或氢的自由基通过非动力学过程，灰化气相的碳氢化合物和表面碳、�/span></p><p><span><strong></strong></span></p><p><strong></strong></p><p><strong><span>GV10x </span><span>应用顴�/span></strong></p><p><span>GV10x </span><span>等离子清洗器</span>去除碳氢污染的能力是一个巨大突破，超越了使用冷却捕捉、氮气吹尘等缓和污染的传统方法和其它等离子清洗机、�span>GV10x</span>，以其扩展的功率和压力范围（<span>5 </span>臲�span> 100 </span>� 咋�span>2 </span>臲�span><0.005 </span>托）<span>� </span>代表亅�span>SEMs</span>和其他真空系统中除碳的典范转移、�/span></p><p><span>原子氧和氢可以将表面碳转换成气相分子然后被泵出到腔体外，而不仅是被固定和捕获在表面，从而消除污染、�/span><span>SEM</span><span>腔中低的碳含量使样品假象比如聚合物沉积得�?小化、�/span></p><p><span></span></p><p><strong><strong></strong></strong><span><strong><strong><span><strong><span><strong><span>Negative [or positive] charging scan squares & charging artifacts cause critical measurement and observational errors removed and prevented - Courtesy of Infineon on LEO 1550</span></strong></span></strong></span></strong></strong></span></p><p><span><strong><span>由于各个仪器的清洁周期不同，可以通过在不同的仪器之间更换</span><span>GV10x </span><span>源将</span><span>GV10x </span><span>顺流灰化器应用在几个实验室工具上、�/span><span>�?/span><span>GV10x</span><span>源和仪器真空腔之间放置一个隔离阀，如</span><span>S-4700 FESEM</span><span>所示，可以使重新安�?/span><span>GV10x</span><span>顺流成灰器变得更加简便、�/span></strong></span></p><p><span><strong><span></span></strong></span></p><p><span><strong></strong><span><strong><span> GV10x DS Asher on </span></strong><strong><span> GV10x on Zeiss EDX Port </span></strong><strong><span> GV10x DS Asher on</span><span> Hitachi S-4700 SEM <span>Tecnai TEM F20</span></span></strong></span><strong></p><p></strong><span> 随着纳米科学的进步，电子束聚焦的更好、电子束能量降低、前驱气体的使用增加，使得高分辨率日益依赖于将碳污染控制在较低水平。通过远程或顺流等离子工艺消除污染和去污染能够迅速、简便和有效地完成这样的任务。与普通的</span><span>‛�/span><span>等离子清洗机</span><span>‛�/span><span>中的动力学溅射、刻蚀清洁不一样，</span><span>顺流等离子工艺是一个柔和的化学刻蚀。这个工艺已经革新了在真空腔体中消除碳分子和碳氢化合物的方式、�/span></span></p><p><span></span></p><p><span><strong></strong><strong><span> GV10x on Synchrotron GV10x on XPS GV10x on NASA Shock</span></strong></span></p><p><span><strong><span> Test Chamber Tube O2 Plasma</span></strong></span></p><p><span>GV10x DS Asher</span><span>以较高的原子氧和氢浓度和更少的时间就可以达到同样精妙的去除污染的效果，因此只需很短的时间就可以得到全新清洁的腔体，非常适合大尺寸的腔体和重度污染的表面。客户声称，使用</span><span>GV10x</span><span>可以使整个大型腔体的碳氢水平得到更加有效和均匀的控制，而只需要现存方法的十分之一的时间，同时具有更加好的均匀性、�/span></span></p><p><span></span></p><p><strong><span>GV10x DS Asher Hydrogen on FEI NanoSem</span></strong></span></p><p><span>GV10x电镜等离子清洗器链接</span></p> </div>  <div class="cxd"> <div class="cxd_tit"><span></span>创新炸�/div> <p style=" color: #333; font-size: 14px; margin: 10px 0 0; line-height: 26px;"> 暂无数据� </p> 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