鐪嬩簡NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勭敤鎴峰張鐪嬩簡
鐣欒█璇环
铏氭嫙鍙峰皢鍦180绉掑悗澶辨晥
浣跨敤寰俊鎵爜鎷ㄥ彿
?浜у搧绠€浠婞/span>SWC-4000鍨婥MP鍚庢竻娲楁満鏄編鍥絅ANO MASTER鍏徃寮€鍙戠殑涓€娆剧鐮旂骇鐨勯珮绔竻娲楃郴缁燂紝鐢ㄤ簬鍘婚櫎鏅跺渾鍦–MP宸ヨ壓鍚庢櫠鍦嗚〃闈㈡薄鏌撶墿銆佹畫鐣欑墿銆佹垨寰皹棰楃矑绛夈€傝绯荤粺闆嗘垚浜嗙編鍥絅ANO MASTER鍏徃鏃犳崯DI姘村厗澹版竻娲?*鎶€鏈紝閰嶅悎鍥涜矾鐨勫寲瀛﹁瘯鍓傛竻娲楋紝PVA鍒锋礂浠ュ強甯﹀紓涓欓唶鐨勯珮閫熺敥骞茬瓑娓呮礂妯″潡锛屽浜庡崟鐗囨竻娲楄€岃█鍏锋湁**鐨勫熀搴曟竻娲楄兘鍔涳紝鏄鐮擟MP鍚庢竻娲楁満鐨?*浠櫒銆侟/span>
?鎶€鏈壒鑹秉/span>
?鍏煎4锛?锛?锛?2瀵哥墖鏅跺渾锛屽悓鏃跺彲鐢ㄤ簬**7鈥漍 7鈥濇帺鑶滅増娓呮礂銆侟/span>
?骞茶繘骞插嚭鎴栨箍杩涘共鍑恒€侟/span>
?闆嗘垚浜?*鐨勬棤鎹熷厗澹版竻娲楁妧鏈紝鍚屾椂鏀寔鍘荤瀛愭按鍐叉礂銆佸寲瀛﹁瘯鍓傛竻娲椼€?span>PVA鍒峰瓙鍒锋礂銆佺孩澶栫伅鐑樺共/姘皵鍚规壂鐢╁共娓呮礂妯″潡銆侟/span>
?閰嶇疆4璺寲瀛﹀鍣ㄧ綈锛屽彲鏀寔4璺寲瀛︽竻娲楁恫杩涜娓呮礂銆侟/span>
?涓ょ骞茬嚗妯″紡锛氶珮閫熺敥骞蹭笌绾㈠鐑樺共锛屽彲鍚屾椂浣跨敤銆侟/span>
?鐢ㄦ埛鍙紪绋嬬殑娓呮礂骞茬嚗宸ュ簭锛屾瘮濡傦細
Cycle I锛氬寲瀛﹁瘯鍓傛竻娲桙/span>
Cycle II锛氬幓绂诲瓙姘村啿娲桙/span>
Cycle III锛氬埛瀛愬埛娲桙/span>
Cycle IV锛氬厗澹板幓绂诲瓙姘存竻娲桙/span>
Cycle V锛氭棆杞敥骞诧紝姘皵鍚规壂鍙婄孩澶栫伅鐑樺共
姣忎竴濂楃▼搴忓彲浠ユ敮鎸?/span> 20涓搷浣滄楠ゃ€侟/span>
?鍙互瀛樺偍澶氳揪25濂椾骇鍝佺▼搴忋€侟/span>
?缁撴瀯绱у噾锛岄泦鎴愬害楂橈細鎶婃墍鏈夌殑娓呮礂闇€瑕侀泦鎴愬埌涓€涓揣鍑戠殑绔嬫煖涓 锛屾棆杞竻娲楀崟鍏冦€佸厗澹拌剦鍐插皠娴佹竻娲楀櫒銆佽瘯鍓傚鍣ㄤ互鍙婃墍鏈夌殑闃€鍙婁紶鎰熷櫒 閮藉叏閮ㄥ寘鍚埌璇ョ郴缁熴€侟/span>
?甯﹁Е鎽稿睆鐨凕span>PLC鎺у埗銆侟/span>
?涓昏鎶€鏈弬鏁?/span>
Wafer灏哄 |
4锛?锛?锛?2瀵哥墖鏅跺渾锛屽彲鐢ㄤ簬**7鈥漍 7鈥濇帺鑶滅増娓呮礂 |
娓呮礂妯″潡 |
鍘荤瀛愭按鍐叉礂銆丳VA鍒峰瓙鍒锋礂銆佸寲瀛﹁瘯鍓傛竻娲椼€佸厗澹版竻娲桙/span> |
鍘荤瀛愭按 |
1.5L/min锛?0PSI |
PVA鍒饵/span> |
鍒峰瓙鏃嬭浆杞€燂細**400RPM |
鍖栧璇曞墏娓呮礂 |
4涓?鍗囧鍣ㄧ綈鐢ㄤ簬瑁呯█閲婄殑鍖栧娓呮礂娑诧紝閫氳繃N2鏂藉帇鎺у埗娴侀噺涓庡鍣ㄧ綈瑁呭嵏銆侟/span> |
鍏嗗０娓呮礂 |
棰戠巼锛?MHz鍔熺巼锛?0W |
骞茬嚗鏂瑰紡 |
鏃嬭浆鐢╁共銆佹爱姘斿惞鎵€佺孩澶栫伅鐑樺共 |
瀛樺偍recipe |
*澶?5涓紝姣?涓猺ecipe鍙互鏀寔 20 涓竻娲楁楠わ紝鑰屽湪姣忎竴涓楠や腑鍙互璁惧畾浠ヤ笅鍙傛暟锛 RPM 杞€ 锛堢淮鎸佺殑杞€ 銆 RAMP鍔犻€熸搴︼紙澶氬揩鏃堕棿杈惧埌閭ｄ釜閫熷害锛 銆 Dwell 杩愯鏃堕棿 锛堢淮鎸佹兂瑕佺殑閫熷害鐨勬椂闂存湁澶氶暱锛夈€侟/span> |
鏃嬭浆鍙?/span> |
杞€燂細0-2000RPM 鍔犻€熷害/鍑忛€熷害锛欬1-25.5绉掞紙浠?.1绉掍负澧為噺锛堻/span> |
姣忔楠ゆ棆杞淮鎸佹椂闂滁/span> |
**鍒?50绉掞紙浠?.1绉掍负澧為噺锛堻/span> |
姣忔楠?缁存寔鏃嬭浆)鐨勮瘯鍓傚垎甯冩椂闂滁/span> |
1-540绉掞紙浠?绉掍负澧為噺锛堻/span> |
姣忔楠?鍙橀€熼樁娈?鐨勮瘯鍓傚垎甯冩椂闂滁/span> |
1-25绉掞紙浠?绉掍负澧為噺锛堻/span> |
鍖栧璇曞墏鍒嗛厤閫熺巼 |
@15 PSI of N2锛 83ccm (based on D.I.H2O) @20PSI of N2锛 133ccm (based on D.I.H2O) |
鎺у埗鍣?/span> |
PLC鎺у埗绯荤粺锛孡CD瑙︽帶灞忔帶鍒迭/span> |
浠櫒灏哄 |
28鈥?32鈥?54鈥滭/span> |
?搴旂敤
?Post CMP Wafer Cleaning
?Patterned and Un-patterned Masks and Wafers
?Ge锛 GaAs and InP Wafer Cleaning
?Cleaning of Diced Chips on Wafer Frame
?Cleaning after Plasma Etch or Photoresist
?Stripping
?Mask Blanks or Contact Mask Cleaning
?Cleaning of X-ray and EUV Masks
?Optical Lens Cleaning
?Cleaning of ITO Coated Display Panels
?Megasonic Assisted Lift-off Process
鏆傛棤鏁版嵁锛
NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勫伐浣滃師鐞嗕粙缁嶏紵NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勪娇鐢ㄦ柟娉曪紵NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満澶氬皯閽变竴鍙帮紵NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満浣跨敤鐨勬敞鎰忎簨椤更/li>NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勮鏄庝功鏈夊悧锛烖/li>NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勬搷浣滆绋嬫湁鍚楋紵NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鐨勬姤浠峰惈绁ㄥ惈杩愯垂鍚楋紵NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鏈夌幇璐у悧锛烖/li>NanoMaster SWC-4000鍨婥MP鍚庢竻娲楁満鍖呭畨瑁呭悧锛烖/li>
绉诲姩绔?/p>
宸ュ晢宸叉牳瀹濣/p>
