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SAM半导体可饱和吸收 1064nm (Saturable Absorber Mirror 1064 nm)
品牌:BATOP
型号:SAM-1064
关键诌半导体可饱和吸收镜， 可饱和吸收耦合输出镜， 共振可饱和吸收镜 可饱和噪声去除腔 可饱和吸收体
BATOP 现已成为用于被动锁模激光器的可饱和吸收体的****供应商。可饱和吸收产品集合了各式各样的不同的器件，从可饱和吸收?SESAM)，到可饱和输出镜(SOC)和用于透过应用的可饱和吸收?SA)。迄今为止，可饱和吸收产品已经覆盖了800nm?.6m的常用激光波长范围、/p>
SAM product list
Wavelength region 790 nm-830 nm: 800 nm
Wavelength region 910 nm-990 nm: 940 nm | 980 nm
Wavelength region 1020 nm-1150 nm: 1040 nm | 1064 nm | 1100 nm
Wavelength region 1110 nm-1320 nm: 1150 nm | 1300 nm
Wavelength region 1320 nm-1460 nm: 1340 nm | 1420 nm
Wavelength region 1470 nm-1660 nm: 1510 nm | 1550 nm | 1645 nm
Wavelength region 1900 nm-3200 nm: 2000 nm | 2150 nm | 2400 nm | 3000 nm
SAM 1064 |
|
laser wavelength |
= 1064 nm |
high reflection band (R>99%) |
= 1020 .. 1110 nm |
absorption |
A0 = 0.5 - 70 % |
relaxation time |
~ 500 fs - 27 ps |
型号参数９/p>
Part No.help |
Delivery time |
Description |
SAM-1064-0.7-1ps-x |
1 week |
SAM: = 1064 nm absorptance 0.7 % R = 0.4 %＋/p> ~ 1 ps |
SAM-1064-1-1ps-x |
1 week |
SAM: = 1064 nm absorptance 1 % R = 0.6 %＋/p> ~ 1 ps |
SAM-1064-1.5-1ps-x |
1 week |
SAM: = 1064 nm absorptance 1.5 % R = 0.8 %＋/p> ~ 1 ps |
SAM-1064-2-1ps-x |
1 week |
SAM: = 1064 nm absorptance 2 % R = 1.2 %＋/p> ~ 1 ps |
SAM-1064-3-1ps-x |
1 week |
SAM: = 1064 nm absorptance 3 % R = 1.6 %＋/p> ~ 1 ps |
SAM-1064-3.5-1ps-x |
1 week |
SAM: = 1064 nm absorptance 3.5 % R = 2 %＋/p> ~ 1 ps |
SAM-1064-4-1ps-x |
1 week |
SAM: = 1064 nm absorptance 4 % R = 2.4 %＋/p> ~ 1 ps |
SAM-1064-5-1ps-x |
1 week |
SAM: = 1064 nm absorptance 5 % R = 3 % ~ 1 ps |
SAM-1064-6-1ps-x |
1 week |
SAM: = 1064 nm absorptance 6 % R = 3.5 % ~ 1 ps |
SAM-1064-8-500fs-x |
1 week |
SAM: = 1064 nm absorptance 8 % R = 5 % |
SAM-1064-10-1ps-x |
1 week |
SAM: = 1064 nm absorptance 10 % R = 6 %＋/p> ~ 1 ps |
SAM-1064-13-500fs-x |
1 week |
SAM: = 1064 nm absorptance 13 % R = 8 % |
SAM-1064-18-500fs-x |
1 week |
SAM: = 1064 nm absorptance 18 % R = 10 %＋/p> ~ 500 fs antiresonant multi quantum well structure＋/p> |
SAM-1064-23-1ps-x |
1 week |
SAM: = 1064 nm absorptance 28 % R = 15 %＋/p> ~ 1 ps antiresonant multi quantum well structure＋/p> |
SAM-1064-26-1ps-x |
1 week |
SAM: = 1064 nm absorptance 28 % R = 13 %＋/p> ~ 1 ps resonant multi quantum well structure＋/p> |
SAM-1064-38-1ps-x |
1 week |
SAM: = 1064 nm absorptance 38 % R = 23 %＋/p> ~ 1 ps antiresonant multi quantum well structure＋/p> |
SAM-1064-70-500fs-x |
1 week |
SAM: = 1064 nm absorptance 70 % R = 40 %＋/p> ~ 500 fs |
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