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Plasma Etcher等离子刻蚀朹/strong>
NPC-3500(A)全自动等离子刻蚀朹/strong>概述9span>NANO-MASTER 等离子刻蚀和清洗系统是专门设计用来满足晶圆批处理或者单晶片处理的广泛应用,从晶圆的光刻胶剥离到表面改性都涉及到。该系列的设备采?/span>PC控制,可以配套不同的等离子源,加热或不加热基片夹其/span>+/span>具有****的能劚/span>:可以仍/span>PE等离子刻蚀切换?/span>RIE刻蚀模式+/span>也就是说可以支持各向同性和各向异性的各种应用、/span>
NPC-3500(A)全自动等离子刻蚀朹/strong>产品特点
紧凑型立式系绞/span>
自动上下载片
带Load Lock
不锈钢、铝制腔体或钟罩式耐热玻璃腓/span>
兼容100级超净间使?/span>
淋浴头?/span>ICP或微波等离子溏/span>
旋转样品?/span>
RF偏压?/span>PID控制加热?/span>300 C或冷却的样品?/span>
全自动或手动RF调谐
*多可支持5?/span>MFC带电抛光的气体管?/span>
PC计算机控制的气动阀
带密码保护的多级访问控制
基于LabView软件皃/span>PC计算机全自动控制
机械泵的压力可达?/span>10mTorr
250 l/s的涡轮分子泵
极限真空丹/span>5x10-7Torr
完整的安全联?/span>
NPC-3500(A)全自动等离子刻蚀朹/strong>应用9/span>
有机物以及无机物的残留物去除
光刻胶剥离或灰化
去残胶以及内腐蚀(深腐蚀)应用
清洗微电子元件,电路板上的钻孔或铜线框架
提高黏附性,消除键合问题
塑料的表面改型:O2处理以改进涂覆性能
产生亲水或疏水表靡/span>
NPC-3500(A)全自动等离子刻蚀朹/strong>Features9/span>
Stand Alone System
Auto wafer Load/Unload with load lock
Stainless Steel Aluminum or Bell Jar Chambers
Class 100 Clean Room Compatible
Shower Head ICP or Microwave Plasma Sources
Rotating Platen
RF Biasable Heated up to 300 C PID Controlled or Cooled Platen
Fully Automated or Manual RF tuning
Up to 5 Mass Flow Controllers with Electropolished Gas Lines
PC Controlled Pneumatic Valves
Multiple Levels of Access with Password Protection
PC Controlled with LabVIEW
Mechanical Pump with Pressure goes to 10 mTorr
250 l/sec Turbomolecular Pump
5x10-7 Torr Base Pressure
Fully Safety Interlocked
NPC-3500(A)全自动等离子刻蚀朹/strong>Applications:
Removal of Organic and Inorganic Materials without Residues
Photoresist Stripping or Ashing
Desmearing and Etch Back Applications
Cleaning Microelectronics Drilled Holes on Circuit Boards or Cu Lead Frames
Adhesion Promotion Elimination of Bonding Problems
urface Modification of Plastics: O2 Treatment for Paintability
Producing Hydrophilic or Hydrophobic Surfaces
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