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溅射离子枪主要用逓
溅射清洗/表面科学中样品表面处理, MBE and HV 溅射过程
离子辅助沉积
离子束溅射镀膛/span>
反应离子刻蚀
技术指栆
离子能量 | 25eV - 5keV |
总的离子束电?/span> | 1mA (at 5kV with Argon) High Current Version: up to 4mA (at 5kV with Argon) |
电流密度 | 120A/cm2 at 100mm working distance |
离子束发散角 | Ion energy dependant (typically 15) |
工作距离 | 100 mm (typically) |
等离子体?/span> | Alumina (superior than other dielectric materials due to highest yield of secondary electrons) |
气体进气口径 | CF-16 (1.33“OD) |
气体流逞/span> | 1 - 5 sccm (1? sccm typical gas dependant) |
工作真空?/span> | 10-6mbar - 10-3mbar (1x10-5mbar typical in chamber with 300l/s pimp). Low 10-6 mbar range possible - beam current then 140A max. |
激发模弎/span> | 微波放电等离子体 (无灯? |
安装口径 | CF-35 (2.75“OD) |
枪直徃/span> | 34mm (真空? |
泄露阀 | 需要气体质量流量计 |
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