台式原子层沉积系�?参数-价格-中国粉体罐�/title>

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<p><meta/><meta/><meta/></p><p><strong><span>台式三维原子层沉积系绞�span>ALD</span></strong></p><p><strong></strong></p><p><strong></strong></p><p><strong><span>原子层沉�?/span></strong><span>（Atomic layer deposition� ALD）是通过将气相前驱体脉冲交替的通入反应器，化学吸附在沉积衬底上并反应形成沉积膜的一种方法，是一种可以将物质以单原子膜形式逐层的镀在衬底表面的方法。因此，它是一种真正的纳米技术，以精确控制方式实现纳米级的超薄薄膜沉积。由于ALD利用的是饱和化学吸附的特性，因此可以确保对大面积、多空、管状、粉末或其他复杂形状基体的高保形的均匀沉积、�/span></p><table align="center" cellspacing="0" cellpadding="2" border="1" bordercolor="#f2f2f2" width="100%"><tbody><tr><td align="center"><p><span></span></p></td><td align="left"><p><span>美国ARRADIANCE公司的GEMStar XT系列台式 ALD系统，在小巧的机身（78 x56 x28 cm）中集成了原子层沉积所需的所有功能，�?多容�?�?英寸基片同时沉积。GEMStar XT全系配备热壁，结合前驱体瓶加热，管路加热，横向喷头等设计� 使温度均匀性高�?9.9%，气流对温度影响减少�?.03%以下。高温度稳定度的设计不仅实现� 8英寸基体上膜厚的不均匀性小�?%，而且更适合对超高长径比的孔径结构等3D结构实现均匀薄膜覆盖，可实现对高�?500�?长径比微纳深孔内部的均匀沉积、�/span></p></td></tr></tbody></table><p><span></span></p><table align="center" cellspacing="0" cellpadding="2" border="1" bordercolor="#f2f2f2" width="100%"><tbody><tr><td><p><span><strong>GEMStar XT 产品特点９�/strong></span><strong><span><o:p></o:p></span></strong></p><p><span>� 300� 铝合金热壁，对流式温度控刵�span><o:p></o:p></span></p><p><span>� </span><span>175� 温控<span>150ml</span>前驱体瓶＋�span>200� </span>控输运支箠�span><o:p></o:p></span></p><p><span>� </span><span>可容纳多牆�span>4</span>＋�span>6</span>＋�span>8</span>英寸样品同时沉积<span><o:p></o:p></span></p><p><span>� </span><span>可容纲�span>1.25</span>英寸<span>/32mm</span>厚度的基佒�span><o:p></o:p></span></p><p><span>� </span><span>标准<span>CF-40</span>接口 <span><o:p></o:p></span></p><p><span>� </span><span>可安装原位测量或粉末沉积模块等选件<span><o:p></o:p></span></p><p><span>� </span><span>等离子体辅助<span>ALD</span>插件<span><o:p></o:p></span></p><p><span>� </span><span>多种配件可供选择</span></p></td><td><p><span><strong>GEMStar XT 产品型号９�/strong></span><strong><span><o:p></o:p></span></strong></p><p><strong><span>GEMStar -4 XT９�/span></strong><strong><span><o:p></o:p></span></strong></p><p><span>� </span><span>**<span>4</span>英寸<span>/100 mm</span>基片沉积<span><o:p></o:p></span></p><p><span>� </span><span>单路前驱体输运支管，<span> 4</span>路前驱体瓶接叢�span><o:p></o:p></span></p><p><span>� </span><span>不可升级为等离子体增弹�span>ALD<o:p></o:p></span></p><p><strong><span>GEMStar -6/8 XT９�/span></strong><strong><span><o:p></o:p></span></strong></p><p><span>� </span><span>**<span>6</span>英寸<span>(150mm)/8</span>英寸<span>(200mm)</span>基片沉积<span><o:p></o:p></span></p><p><span>� </span><span>双路前驱体输运支管，<span> 8</span>路前驱体瓶和<span>CF-40</span>接口<span><o:p></o:p></span></p><p><span>� </span><span>可升级为等离子体增强<span>ALD</span></p></td></tr><tr><td><p></p></td><td align="left"><p><span><strong><span>GEMStar</span></strong></span><strong><span> -8 XT-P</span></strong><strong><span>９�/span></strong><span><o:p></o:p></span></p><p><span>� </span><span>**<span>8</span>英寸<span>/200mm</span>基片沉积<span><o:p></o:p></span></p><p><span>� </span><span>双路前驱体输运支管，<span> 8</span>路前驱体瓶和<span>CF-40</span>接口<span><o:p></o:p></span></p><p><span>� </span><span>装备高性能<span>ICP</span>等离子发生器</span><strong><span><o:p></o:p></span></strong></p><p><span>13.56 MHz 的等离子<span>源非帷�/span>紧凑，只需风冷�?*运行功率辽�span>300W</span>、�/span><strong><span><o:p></o:p></span></strong></p><p><span>� </span><span>标配３组气流质量控制计（<span>MFC</span>）控制的等离子气源线，和一杠�span>MFC</span>控制的运载气体线，使难以沉积的氧化物、氮化物、金属也可以实现均匀沉积、�/span><strong></strong></p></td></tr><tr><td colspan="1" rowspan="1"><p></p></td><td colspan="1" rowspan="1" align="left"><p><strong><span>GEMStar NanoCUBE９�/span></strong></p><p><strong></strong></p><p><span>* **100 mm 立方体样� 沉积</span></p><p><span>* 单路前驱体输运支管， 2路前驱体瓶接叢�/span></p><p><span>* 主要用于3D多孔材料，以及厚样品的沉�?/span></p></td></tr></tbody></table><p><span></span></p><p><strong>丰富配件９�/strong></p><p><strong></strong></p><table align="center" cellspacing="0" cellpadding="2" border="1" bordercolor="#f2f2f2" width="100%"><tbody><tr><td colspan="2"><p><span><strong>多样品托盘：</strong></span></p><p><span>* 多样品夹具，样品尺寸�?"� 6"� 4"）向下兼容、�/span></p><p><span>* 多基片夹具，*多同时容�?片基片、�/span></p><p><span></span></p></td><td colspan="1" rowspan="1"></td><td><p><span><strong>温控热托盘：</strong></span></p><p><span>* 可加热样品托盘，**温度500℃，可实现热�?热壁复合加热方式、�/span></p><p></p><p></p></td></tr><tr><td colspan="2"><p><span><strong></strong></span></p><p><span><strong>粉末沉积盘：</strong></span></p><p></p><p></p></td><td colspan="1" rowspan="1"></td><td><p><span><strong></strong></span></p><p><span><strong>臭氧发生器：</strong></span></p><p><span><strong></strong></span></p></td></tr><tr><td colspan="2"><p><span><strong>真空进样器（Load Lock（�/strong></span></p><p><span><strong></strong></span></p><p></p></td><td colspan="1" rowspan="1"></td><td><p><span><strong>晶振测厚�?/strong></span></p><p><span><strong></strong></span></p><p></p></td></tr><tr><td colspan="2"><p><span><strong>前驱体瓶９�/strong></span></p><p></p><p></p></td><td colspan="1" rowspan="1"></td><td><p><span><strong>前驱体加热套９�/strong></span></p><p></p></td></tr><tr><td colspan="4"><p><span><strong>粉末旋转沉积罐模块：</strong></span></p><p><span>配合热壁加热方式，进一步实现对微纳粉末样品全保型薄膜均匀沉积包覆、�/span></p></td></tr><tr><td colspan="2" rowspan="1"><p></p></td><td colspan="1" rowspan="1"></td><td colspan="1" rowspan="1"><p></p></td></tr><tr><td colspan="4"><p><span><strong>手套箱接口：</strong></span></p><p><span>可从侧面或背�?*接入手套箱，与从底部接入手套箱不同，不占用手套箱空间。由于主机在手套箱侧面，反应过程中不对手套箱有加热效应，不影响手套箱内温度� </span></p></td></tr><tr><td rowspan="2"><p></p></td><td colspan="3"><p></p></td></tr><tr><td colspan="3"><p></p></td></tr></tbody></table><p><strong></strong></p><p><strong><span>应用案例</span></strong></p><table align="center" cellspacing="0" cellpadding="2" border="1" bordercolor="#f2f2f2" width="100%"><tbody><tr><td align="center"><p><span></span></p></td><td align="center"><p></p></td><td align="center"><p><span></span></p></td></tr><tr><td align="center"><p><span></span></p></td><td align="center"><p><span></span></p></td><td align="center"><p><span></span></p></td></tr><tr><td align="center"><p><span></span></p></td><td align="center"><p><span></span></p></td><td align="center"><p><span></span></p></td></tr></tbody></table><p><span><o:p></o:p></span></p><p><strong><span>应用领域</span></strong></p><p><strong><span></span></strong></p><p><span><o:p></o:p></span></p><p><strong><span>国内外用戶�/span></strong></p><p><strong><span></span></strong></p><p><strong></strong></p><p><strong><span>已发表文�?/span></strong></p><p><span>1�?/span><span>Lo?c</span><span>Assaud et al. Systematic increase of <span>electrocatalytic</span> turnover over <span>nanoporous</span><span>Pt</span> surfaces Prepared by atomic layer deposition. </span><span><em>J. Mater. Chem. A </em>(<strong>2015</strong>) DOI: 10.1039/c5ta00205b</span></p><p><span><span>2�?/span>Xiangyi</span><span>Luo et al. <span>Pd</span> nanoparticles on <span>ZnO-passivated</span> porous carbon by atomic layer deposition: an effective electrochemical catalyst for Li-O2 battery. <span><em>Nanotechnology</em><strong>(</strong></span><span><strong>2015</strong>) 26� 164003. DOI:10.1088/0957-4484/26/16/164003</span></p><p><span><span>3�?/span>HengweiWang� et al. Precisely-controlled synthesis of <span>Au@Pd</span> core–shell bimetallic catalyst via atomic layer deposition for selective oxidation of benzyl alcohol. <em>Journal of Catalysis </em>(<strong>2015</strong>) 324� 59‒�/span><span>68. DOI: 10.1016/j.jcat.2015.01.019</span></p><p><span><span>4�?/span> Sean W. Smith� et al. Improved oxidation resistance of organic/inorganic composite atomic layer deposition coated cellulose <span>nanocrystal</span> aerogels. </span><span><em>J. Vac. Sci. Technol. A </em>(<strong>2014</strong>) 4� 32 DOI: 10.1116/1.4882239</span></p><p><span><span>5�?/span>Fatemeh Sadat <span>MinayeHashemi</span> et al. A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal?Dielectric Patterns. <strong><em>J. Phys. Chem. C </em></strong>(<strong>2014</strong>)� 118� 10957?</span><span>10962. DOI: 10.1021/jp502669f</span></p><p><span><span>6�?/span>Jeffrey B. Chou� et.al Enabling Ideal Selective Solar Absorption with 2D Metallic Dielectric Photonic Crystals. </span><span><strong><em>Adv. Mater. </em></strong>(<strong>2014</strong>)� DOI: 10.1002/adma.201403302.</span></p><p><span><span>7�?/span> Jin <span>Xie</span>� et al. Site-Selective Deposition of Twinned Platinum Nanoparticles on TiSi2 <span>Nanonets</span> by Atomic Layer Deposition and Their Oxygen Reduction Activities. <strong><em>ACS Nano </em></strong><em>(<strong>2013</strong>)� </em>7� 6337‒�/span><span>6345. DOI: 10.1021/nn402385f</span></p><p><span><span>8�?/span>Pengcheng Dai� et al. Solar Hydrogen Generation by Silicon Nanowires Modified with Platinum Nanoparticle Catalysts by Atomic Layer Deposition. <span><strong><em>Angew</em></strong></span><strong><em>. Chem. Int. Ed. </em></strong>(<strong>2013</strong>)� 52� 1 ‒�/span><span>6. DOI: 10.1002/anie.201303813</span></p><p><span><span>9�?/span>Joseph Larkin et al. Slow DNA Transport through <span>Nanoporesin</span> Hafnium Oxide Membranes. <strong><em>ACS Nano</em></strong>(<strong>2013</strong>)� 11� 10121‒�/span>10128. DOI: 10.1021/nn404326f</span></p><p><span>10<span>�?/span><span>Thomas M et al. Extended lifetime MCP-PMTs: Characterization and lifetime measurements of ALD coated <span>microchannel</span> plates� in a sealed photomultiplier tube <em>Nuclear Instruments and Methods in Physics Research A </em>(<strong>2013</strong>) 732� 388‒�/span><span>391. DOI: 10.1016/j.nima.2013.07.023</span></p><p><span>11<span>�?/span>Kevin J. Maloney et al. <span>Microlattices</span> as architected thin films: Analysis of mechanical properties and high strain elastic recovery. APL Mater. 1� 022106 (<strong>2013</strong>) DOI: 10.1063/1.4818168</span></p><p><span><span>12<span>�?/span> Sean W. Smith et al. Improved Temperature Stability of Atomic Layer Deposition Coated Cellulose <span>Nanocrystal</span> Aerogels. </span><span><em>Mater. Res. Soc. Symp. Proc. </em>(<strong>2012</strong><span>) </span><span>DOI: 10.1557/opl.2012.</span></p> </div>  <div class="cxd"> <div class="cxd_tit"><span></span>创新炸�/div> <p style=" color: #333; font-size: 14px; margin: 10px 0 0; line-height: 26px;"> 暂无数据� </p> </div>  <div class="xgfa"> <div class="xgfa_tit"> <div> <span></span>相关方案 </div> </div> <div class="xgfa_box" style="display: block;"><div style="padding:10px;">暂无相关方案、�/div> </div> </div> <script> $(function(){ // 切换 $(".xgfa_tit_ul li").hover(function(){ $(".xgfa_tit_ul li").css({"color":"#4F5862","border-bottom-color":"transparent"}); $(this).css({"color":"#1479d7","border-bottom-color":"#1479d7"}); var _index = $(this).index(); $(".xgfa_box").css("display","none"); $(".xgfa_box").eq(_index).css("display","block"); }); }); </script>  <div class="xgzl"> <div class="cxd_tit"><span></span>相关资料</div> <div class="xgzl_box"><div style="padding:10px;">暂无数据、�/div> </div> </div>  <div class="yhpl"> <div class="cxd_tit"><span></span>用户评论</div> <form id="FormComments" action="" method="post" onsubmit="return false"> <input name="SaveProComments" id="SaveProComments" type="hidden" value="yes" /> <input name="ProductID" id="ProductID" type="hidden" value="250387" /> <input name="ProQuality" id="ProQuality" type="hidden" value="10" /> <input name="ProService" id="ProService" type="hidden" value="10" /> <input name="ProUsability" id="ProUsability" type="hidden" value="10" /> <input name="ProCostperformance" id="ProCostperformance" type="hidden" value="10" /> <div class="yhpl_pf"> <div> <p>产品质量</p> <div><span id="Quality" class="stars star10"></span><span id="Quality_Val" class="ScoreVal" curScore="10">10刅�/span></div> </div> <div> <p>售后服务</p> <div><span id="Service" class="stars star10"></span><span id="Service_Val" class="ScoreVal" curScore="10">10刅�/span></div> </div> <div> <p>易用�?/p> <div><span id="Usability" class="stars star10"></span><span id="Usability_Val" class="ScoreVal" curScore="10">10刅�/span></div> </div> <div> <p>性价毓�/p> <div><span id="Costperformance" class="stars star10"></span><span id="Costperformance_Val" class="ScoreVal" curScore="10">10刅�/span></div> </div> </div> <div class="yhpl_pftit">评论内容</div> <textarea name="Comments" id="ProComments" onfocus="checklogin();" placeholder="分享产品使用经验/采购评价（不超过500字）">