看了精微高博静态容量法蒸气吸附仪JW-ZQ200的用户又看了
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结构
项目 |
ZQ200C |
ZQ100C |
ZQ100B |
蒸汽发生?/span> |
1?/span> |
1?/span> |
1?/span> |
蒸汽竘/span> |
1?/span>(1/0.1 Torr) |
1?/span>(1/0.1 Torr) |
1?/span>(10 Torr) |
微孔竘/span> |
1?/span>(1/0.1 Torr) |
旟/span> |
旟/span> |
传感?/span> |
7?/span> |
5?/span> |
4?/span> |
冷阱 |
1?/span> |
2?/span> |
2?/span> |
预处理位 |
旟/span>(可原位预处理) |
2?/span> |
2?/span> |
恒温水浴 |
1?/span>(0~50C) |
1?/span>(0~50C) |
1?/span>(0~50C) |
1L液氮?/span> |
2?/span> |
旟/span> |
旟/span> |
3L液氮?/span> |
1?/span> |
2?/span> |
2?/span> |
机械泴/span> |
2?/span>(?/span>1个耐腐蚀泴/span>) |
2?/span>(?/span>1个耐腐蚀泴/span>) |
1个耐腐蚀泴/span> |
分子泴/span> |
1?/span> |
1?/span> |
旟/span> |
特点
带蒸汽发生器作为吸附气气溏/span>
外气室为不锈钢模块,带恒温箱(室?span>~50C(/span>
蒸汽吸附系统,抽真空时经过冷阰/span>
密封件采用全氞span>O形圈
功能
低温氮吸附法,比表面及孔径分布测诔/span>
各种气体和蒸汽的吸附等温线测诔/span>
等量吸附热测宙/span>
气体选择性吸附系数测宙/span>
技术参?/span>
项目 |
ZQ200C |
ZQ100C |
ZQ100B |
测试原理 |
静态容量法 |
静态容量法 |
静态容量法 |
物理吸附性能 |
比表面≥0.01m2/g介孔9/span>2 ~500nm'/span>BJH法)微孔9/span>0.35 ~2 nm (t图法?/span>DR法?/span>MP法?/span>DA法?/span>HK法?/span>SF法?/span>NLDFT泔/span>) |
吋/span>ZQ200C |
吋/span>ZQ200C |
物理吸附?/span> |
氮气、氩气、氪气、二氧化碳等 |
吋/span>ZQ200C |
吋/span>ZQ200C |
蒸汽吸附?/span> |
一氧化碳、氨气等气体以及常温下为液体的物质(有强烈腐蚀、剧毒、危险气体除外) |
吋/span>ZQ200C |
吋/span>ZQ200C佅/span>p0需大于1kPa |
物理吸附温度 |
77K+/span>87K |
吋/span>ZQ200C |
吋/span>ZQ200C |
蒸汽吸附温度 |
0~50C |
吋/span>ZQ200C |
吋/span>ZQ200C |
蒸汽回收 |
分析位蒸汽冷阱回攵/span> |
分析位和预处理位双冷阱蒸汽回攵/span> |
吋/span>ZQ100C |
预处琅/span> |
真空原位预处琅/span> |
预处理位+原位真空处理 |
吋/span>ZQ100C |
测试原理静态容量法
测试范围比表靡/span>?/span>0.01m2/g
介孔2 ~500nm'/span>BJH法)
微孔0.35 ~2 nm(T图法?/span>DR法?/span>MP法?/span>DA法?/span>
HK法?/span>SF法?/span>NLDFT泔/span>)
气体种类氮、氩、氪?/span>CO2?/span>CO、氨、苯、甲烷、乙醇、甲醛、水蒸汽等(有强烈腐蚀、剧毒、危险气体除外)
气体发生?/span>当吸附质在常温常压下是液体时,可通过气体发生?/span>
形成吸附质蒸汽,满足进行气体吸附测试的要汁/span>
吸附压力P/Po < 1'/span>Po吸附质在吸附温度下的饱和蒸汽压)
眞/span>穹/span>泴/span>进口特种耐腐蚀二级旋片式真空泵,极限真穹/span>10-1Pa
分子泴/span>
压力传感?/span>1000 Torr?/span>10Torr?/span>1Torr
吸附温度液氮杯提供液氮温度测试条件,半导体恒温水浴提侚/span>0~ 50C测试条件
进气数量按客户要求,提供4n个(4?/span>8?/span>12)独立进气口
气体回收有害气体通过冷阱回收(冷阱温?/span>77K),确保环境和机械泵油免受污柒/span>
颃/span>夃/span>琅/span>真空原位预处理,温度≣/span>400C1C
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