LOAD LOCK Chamber (option)

LOAD LOCK预真空进样室（可选）

Chamber with front open door

前开门蒸发腔佒�/span>

Cryopump and dry pump

冷凝泵和干泵

Multiple thermal evaporation sources or OLED sources

多个热阻蒸发源或OLED低温蒸发溏�/span>

Max. 6� substrate

6“�/span>基片

Substrate rotation

基片旋转

Substrate bias (option)

基片偏压（可选）

Ion source for substrate cleaning (option)

离子源清洗基片（可选）

Substrate heating to 1000C (option)

基片加热1000�?/span>(可逈�/span>)

Crystal rate monitor and film thickness control

晶振沉积速率及膜厚控刵�/span>

Manual or automatic system control

系统手动或自动控刵�/span>

For deposition of metal� semiconductor and insulation materials

可沉积金属、半导体和绝缘材斘�/span>

For deposition of multi-layer or alloy film